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Reactive-ion etching
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#	Item
1	NANO LETTERS Three-Dimensional Nanostructures Formed by Single Step, Two-Photon Exposures through Elastomeric Penrose Add to Reading List Source URL: rogers.matse.illinois.edu Language: English - Date: 2008-08-15 17:59:48 Electromagnetic radiation Physics Materials science Microtechnology Electromagnetism Optics Raman scattering Crystallography Quasicrystal Nanolithography Raman microscope Deep reactive-ion etching
2	Control of Ion Energy in a Capacitively Coupled Reactive Ion Etcher H. M. Park , C. Garvin, D. S. Grimard and J. W. Grizzle Electronics Manufacturing and Control Systems Laboratory, Dept. of Electrical Engineering and C Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:14 Semiconductor device fabrication Plasma physics Plasma processing Physics Manufacturing Electromagnetism Reactive-ion etching Plasma Langmuir probe Etching Capacitor Capacitively coupled plasma
3	Product Spotlight SOL9350 Series New P+ Contact Paste for N-type Cells N-type cell designs have demonstrated high efficiencies for Add to Reading List Source URL: www.heraeus.com Language: English - Date: 2016-08-11 05:24:23 Semiconductor device fabrication Chemistry Heraeus Materials science Physical chemistry Wafer Viscometer Photovoltaics Deep reactive-ion etching
4	A Demonstration of Broadband RF Sensing: Empirical Polysilicon Etch Rate Estimation in a Lam 9400 Etch Tool Craig Garvin and J. W. Grizzle Department of Electrical Engineering and Computer Science, University of Michigan Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:11 Semiconductor device fabrication Analog circuits Plasma processing Electronic filter topology Microtechnology Reactive-ion etching Crystal oscillator Etching Plasma etching RLC circuit Plasma Q factor
5	Compensation for transient chamber wall condition using realtime plasma density feedback control in an inductively coupled plasma etcher Pete I. Klimecky, J. W. Grizzle, and Fred L. Terry, Jr. Department of Electrical En Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:14 Semiconductor device fabrication Plasma processing Plasma physics Microtechnology Measuring instruments Plasma Reactive-ion etching Langmuir probe Crystal oscillator Etching Microwave Plasma diagnostics
6	Fraunhofer IMS F RAU N HOF E R I NST I T U T E F O R M IC RO E L EC T RO N I C C I RCU I T S A N D SYS T E MS I MS Add to Reading List Source URL: www.ims.fraunhofer.de Language: English - Date: 2016-08-18 14:28:44 Semiconductor device fabrication Microtechnology Wafer Microelectromechanical systems Etching Integrated circuit Photoresist Cleanroom Stepper Deep reactive-ion etching Semiconductor fabrication plant Chemistry of photolithography
7	WALL STATE EFFECTS ON Cl2 POLY-SI RIE: REAL-TIME MEASUREMENTS, MECHANISMS, AND FEEDBACK CONTROL SOLUTIONS Pete I. Klimecky, Jessy W. Grizzle, and Fred L. Terry, Jr. University of Michigan/EECS Dept. , RmBeal A Add to Reading List Source URL: web.eecs.umich.edu Language: English - Date: 2016-04-25 13:15:14 Semiconductor device fabrication Etching Microtechnology Semiconductors Reactive-ion etching Chemical milling Plasma Crystal oscillator Lam Research Gas Isotropic etching
8	PDF Document Add to Reading List Source URL: www.europractice.stfc.ac.uk Language: English - Date: 2011-04-22 07:39:08 Microtechnology Semiconductor device fabrication Etching Process engineering Deep reactive-ion etching Visualization Chemical milling Business process management Process Thermodynamic process Business process modeling Microfabrication
9	FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS IPMS CENTER NANOELECTRONIC TECHNOLOGIES (CNT) 1 2 Add to Reading List Source URL: www.screening-fab.com Language: English - Date: 2016-02-05 07:17:40 Semiconductor device fabrication Microtechnology Thin film deposition Fraunhofer Society Chemical vapor deposition Nanoelectronics Deep reactive-ion etching
10	MEMS, Field-Emitter, Thermal, Fluidic Devices A Tabletop Deep Reactive Ion Etching System for MEMS Development and Production................................................. 101 A Miniature MEMS Vacuum Pump with Curved Add to Reading List Source URL: www-mtl.mit.edu Language: English - Date: 2015-07-31 15:51:13

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